From: Robert Brandau <rebrandau@mmm.com>
Newsgroups: sci.physics.plasma
Subject: Plasma CVD
Date: Mon, 15 Feb 1999 10:53:28 -0500
Organization: 3M Company

I am researching a Plasma Chemical Vapor Deposition process for
manufacturing glass preforms. In other words, I want to deposit
chemicals inside a glass tube using a plasma torch or furnace. I believe
the torch or furnace should be a non transfer arc.

Presently, I am using a hydrogen and oxygen torch for deposition
chemicals. The Plasma CVD would deposit at a higher temperature and more
accurately.

I would greatly appreciate any help you may have.