From: "Lukas" <l.alberts@tu-bs.de>
Newsgroups: sci.physics.plasma
Subject: pulsed DC plasma
Organization: TU Braunschweig, Germany


Hi,

Plasma Assisted Chemical Vapour Deposition enables good deposition of TiN
films..
pulsed DC PACVD is even more convenient.. (tell me why?)
(control of cathode temperature, prevents arcing.. select some times
sensitive
molecular activation..)
there must be some limitation ? like the transit time for e- or ions to
cross the sheath (or electrode spacing?) limiting the pulsing frequency..
but this would be in the 10s of MHz.. (500 Volt potential
1 meter reactor)
may be some kinetic effects, like a depletion of ionic species in the
kathode sheath or pre-sheath?
(extracting those ions too often?)

well now an bipolar pulsed plasma should result in even better thin
films...
what should be the advantage of a short positive pulse at the cathode...
(i now it permits the deposition of dielectric films but in the case of TiN
???)

where can i find more details on those pulse DC low pressure plasma?

thank You

Lukas


--
Dr. Lukas ALBERTS
IOPW, TU-Braunschweig
Bienroder weg 53, D-38108 Braunschweig
tel:+49 (0) 531 391 9415
fax:+49 (0) 531 391 9400
l.alberts@tu-bs.de
http://www.tu-bs.de/institute/iopw/